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专利名称：Exposure method and apparatus therefor发明人：Mamoru Sugita申请号：US07/236848申请日：19880826公开号：US04910549A公开日：19900320
摘要：In an exposure method of the present invention, exposure light is radiated ontoa peripheral portion of a substrate to be processed while the substrate is rotated, andthe rotational speed of the substrate is selectively decreased when a specific peripheralportion reaches an exposure area, thereby performing predetermined exposure of thesubstrate. An exposure apparatus of the present invention includes a mounting table onwhich the substrate is mounted, a rotating mechanism for rotating the mounting table ata predetermined rotational speed, a light radiating element arranged to oppose amounting surface of the mounting table, light amount control means for controlling theamount of light radiated from the light radiating element onto the substrate, androtational speed control means for controlling the rotational speed of the mountingtable in accordance with the radiation amount of light from the light radiating element.
申请人：TOKYO ELECTRON LIMITED,TEL KYUSHU LIMITED
代理机构：Oblon, Spivak, McClelland, Maier & Neustadt
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