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专利名称：Process and apparatus for coating a
substrate
发明人：VANDEN BRANDE, PIERRE,LUCAS,
STEPHANE,WEYMEERSCH, ALAIN
申请号：EP96203211.6申请日：19961119公开号：EP0780486B1公开日：20041222
摘要：In forming a coating of an element, especially a metal, on a substrate movingthrough an evaporation chamber, the novelty is that (a) the chamber is equipped with atarget which has a substrate-facing surface layer containing the element; (b) the coatingis formed by vapour deposition and simultaneous cathodic sputtering of the elementfrom the target; and (c) the ratio of the amounts of evaporated and sputtered element isregulated by the energy supply to the target. Also claimed is a coating apparatusespecially for carrying out the above process, the apparatus having (i) a chamber (3)equipped with a target (4) having a surface layer (5) facing the substrate (1) andcontaining one or more of the elements of the coating (2); (ii) a transport system formoving the substrate (1) preferably continuously past the target (4); (iii) a heat regulatingsystem (9) for holding the surface layer (5) optionally in the liquid state and forcontrolled evaporation of the element; and (iv) a system (6, 8, 10, 11) for cathodicsputtering of the element from the target (4) towards the substrate (1).
申请人：RECHERCHE ET DEVELOPPEMENT DU GROUPE COCKERILL
SAMBRE,COCKERILL RECH & DEV,RECHERCHE ET DEVELOPPEMENT DU GROUPE
COCKERILL SAMBRE
地址：BE
国籍：BE
代理机构：Claeys, Pierre
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